C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/266.3, 260/2
C07D 471/04 (2006.01) C07D 207/28 (2006.01)
Patent
CA 1248108
ABSTRACT OF THE DISCLOSURE The invention relates to novel compounds of the formula Image where X is H, halogen, loweralkyl, loweralkoxy, -CF3, or -OH; R is H, loweralkyl, arylloweralkyl, diarylloweralkyl, loweralkanoyl, arylloweralkanoyl or diarylloweralkanoyl; and R1 is H2, O or -NR2R3, R2 and R3 being independently H or loweralkyl, or taken together with the nitrogen atom to which they are attached constitute Image , R4 in turn being H, loweralkyl, hydroxyloweralkyl, aryl, arylloweralkyl or diarylloweralkyl or pharmaceutically acceptable acid addition salts thereof, which are useful for enchancing memory. The invention relates further to a process and intermediates for the preparation of the above compounds.
503758
Martin Lawrence L.
Scott Susan J.
Setescak Linda L.
Aventis Pharmaceuticals Inc.
Bereskin & Parr
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