C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
C07K 5/062 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) A61K 31/55 (2006.01) A61K 31/675 (2006.01) C07D 498/04 (2006.01) C07D 513/04 (2006.01) C07K 5/06 (2006.01) C07K 5/078 (2006.01) A61K 38/00 (2006.01)
Patent
CA 2176415
Compounds having the following formula I, and pharmaceutically acceptable salts thereof, including dual inhibitors of ACE and NEP and selective ACE inhibitors: Image (I) wherein: Y1 and Y are each independently hydrogen, alkyl, aryl, halogen, or alkoxy; X is O or S(O) t; Image , Image , A is Image , or Image ; t is zero, one or two; m and n are independently zero or one; and wherein R, R5, R5a, R5b, R6, R7, R11, q and r are defined herein.
Robl Jeffrey A.
Sun Chong-Qing
Osler Hoskin & Harcourt Llp
Robl Jeffrey A.
Sun Chong-Qing
LandOfFree
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