Benzoates containing a substituent having olefinic unsaturation

Details Benzoates containing a substituent having olefinic unsaturation Benzoates containing a substituent having olefinic unsaturation

C - Chemistry, Metallurgy

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C07D 309/12 (2006.01) C07C 67/04 (2006.01) C07C 69/76 (2006.01) C07C 69/78 (2006.01) C07D 307/20 (2006.01) C08F 12/22 (2006.01) C08F 220/00 (2006.01) G03F 7/004 (2006.01) G03F 7/023 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2047156

K-18159/A Benzoates containing a substituent having olefinic unsaturation Abstract of the Disclosure Polymers suitable for use as positive photoresists can be prepared, in the absence or presence of other olefinically unsaturated monomers, from benzoates comprising an olefinic unsaturated substituent and consisting of formula I Image (I), wherein R1 and R2 are each independently of the other a hydrogen atom, C1-C4alkyl or phenyl, R3 is a hydrogen atom, methyl or a halogen atom, R4 is a hydrogen atom or methyl, Rs is C1-C4alkyl or C6-C12aryl, and R6 and R7 are each independently of the other a hydrogen atom, C1-C4alkyl or C6-C12aryl, and R5 and R7, when taken together, may also be an unsubstituted or a C1-C4alkyl-, C1-C4alkoxy-, C6-C12aryl- or C6-C12aryloxy-substi- tuted ethylene, propylene or butylene radical.

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