C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/179, 260/295
C07C 275/28 (2006.01) A61K 31/17 (2006.01) A61K 31/395 (2006.01) C07C 273/18 (2006.01) C07C 275/30 (2006.01) C07C 323/44 (2006.01) C07C 323/50 (2006.01) C07D 213/40 (2006.01) C07D 213/56 (2006.01) C07D 311/68 (2006.01) C07D 333/20 (2006.01) C07D 333/24 (2006.01) C07D 335/06 (2006.01)
Patent
CA 2017444
ABSTRACT OF THE DISCLOSURE Benzocycloalkane derivative of the formula Image wherein R is hydrogen or hydrocarbon residue, which may optionally have one or more substituents, Ar is aromatic group, X is oxygen or sulfur atom, ? is 0 or 1, m is 3 to 6 and n is 0 to 2, wherein the ring A and the group Ar each may optionally have one or more substituents, or its pharmaceutically acceptable salt, which is useful as inhibitors for acyl-CoA : cholesterolacyltransferase.
Ikeda Hitoshi
Meguro Kanji
Tawada Hiroyuki
Fetherstonhaugh & Co.
Ikeda Hitoshi
Meguro Kanji
Takeda Chemical Industries Ltd.
Tawada Hiroyuki
LandOfFree
Benzocycloalkane derivatives and production thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Benzocycloalkane derivatives and production thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Benzocycloalkane derivatives and production thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1845030