C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/210, 260/240
C07D 243/14 (2006.01) A61K 31/55 (2006.01) C07D 243/24 (2006.01) C07D 405/12 (2006.01)
Patent
CA 2010769
Abstract of the Disclosure BZDs of the general formula 1: Image (1) where: R represents H, alkyl, alkenyl, cycloalkyl or cycloalkenyl each with up to 8 carbon atoms, phenylalkyl with an alkylene chain of 1 to 3 carbon atoms and optionally substituted on the phenyl radical with one or two substituents selected from the group consisting of Cl, Br, F, CN, CF3, NO2, lower alkyl, and OCH3, or represents a phenyl radical which is optionally substituted with one or two substiiuents selected from the group consisting of Cl, F, Br, CN, I, CF3 NO2, lower alkyl and OCH3, or represents a 5-membered or 6-membered heterocyclic radical with 1 or 2 heteroatoms from the group consisting of O, N and S; R1 represents H or, together with R2, forms a bond; R2 and R4 independently of one another represent H, or an alkyl radical with 1 to 6 carbon atoms, or represent a phenylalkyl radical with an alkyl chain of 1 to 3 carbon atoms and optionally substituted on the phenyl radical with one or two substituents selected from the group consisting of Cl, Br, F, CN, CF3, NO2, CH3, C2H5 and OCH3, or R2 together with R1, forms a bond; R3 is (CH2)nCH or (CH2)n-CR14=CR14, where n is between 0 and 5 inclusive and R14 = H OL a bond; R5 and R6 independently of one another represent H, Cl, F, Br, NO2, CN, CF3, lower alkyl, or OCH3; R7 and R9 are independently CH2 or C=O; R8 is Image , Image , Image , Image , Image , or Image , where p and q are independently between 0 and 4 and the sum of p and q is 4 or less; and R11 and R12 are independently H or a lower alkyl of between 1 and 5 carbon atoms.
Kim Sun H.
Taylor John E.
Biomeasure Inc.
Kim Sun H.
Smart & Biggar
Taylor John E.
LandOfFree
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