C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 319/20 (2006.01) A61K 31/357 (2006.01) A61K 31/36 (2006.01) A61K 31/381 (2006.01) A61P 25/18 (2006.01) C07D 317/46 (2006.01) C07D 409/04 (2006.01)
Patent
CA 2605580
Compounds of formula (I) or pharmaceutically acceptable salts thereof are provided, wherein each of R1, R2, R3, R4, y, n, m, and Ar are as defined, and described in classes and subclasses herein, which are agonists or partial agonists of the 2C subtype of brain serotonin receptors. The compounds, and compositions containing the compounds, can be used to treat a variety of central nervous system disorders such as schizophrenia.
L~invention fournit des composés répondant à la formule (I) ou leurs sels acceptables sur le plan pharmaceutique, où R1, R2, R3, R4, y, n, m, et Ar sont chacun tels que définis, et décrits ici sous forme de classes et de sous-classes, lesquels sont des agonistes ou des agonistes partiels d~un sous-type 2C des récepteurs de la sérotonine dans le cerveau. Les composés, et les compositions contenant les composés, peuvent être utilisés pour traiter une variété de maladies du système nerveux central telles que la schizophrénie.
Gao Hong
Gross Jonathan Laird
Stack Gary Paul
Zhou Dahui
Torys Llp
Wyeth
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