C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/14 (2006.01) A61K 31/395 (2006.01) A61K 31/675 (2006.01) A61K 31/695 (2006.01) C07D 405/14 (2006.01) C07D 409/14 (2006.01) C07D 413/12 (2006.01) C07D 417/14 (2006.01) C07D 419/14 (2006.01) C07F 7/10 (2006.01) C07F 9/6561 (2006.01)
Patent
CA 2171702
Benzofuran compound represented by the formula: Image wherein Image represents a group capable of releasing a cation in which ? represents a single or double bond: R1 represents an optionally substituted heterocyclic residue which may be attached to the oxygen atom through a carbon chain; R2 represents a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon residue, an optionally protected hydroxyl group or an optionally protected amino group; Y represents a di- or tri-valent aliphatic hydrocarbon residue having 1 to 8 carbon atoms; and the benzene ring of the benzofuran moiety may have further substituents; or a salt thereof, which has excellent hypoglycemic and hypolipidemic action.
Momose Yu
Odaka Hiroyuki
Sohda Takashi
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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