C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 311/56 (2006.01) A61K 31/37 (2006.01) A61P 37/08 (2006.01)
Patent
CA 2391239
The present invention provides a compound which is highly safe in terms of toxicity and has a stronger antiallergic action, and particularly has an action of inhibiting both immediate and delayed type allergic reactions. A benzopyran derivative represented by the general formula (I): Image wherein R1 is an alkyl group having 1-10 carbon atoms or an alkenyl group having 2-10 carbon atoms, and one of R2, R3, R4, and R5 is an alkoxy group substituted with a hydroxygroup or an alkoxy group substituted with a carboxy group, and the others are hydrogen atoms or physiologically acceptable salts thereof are superior as the active ingredient of an antiallergic agent.
Aoki Yasuo
Kimura Nobuyuki
Takagaki Hidetsugu
Tanabe Shingo
Activus Pharma Co. Ltd.
Dainippon Ink And Chemicals Inc.
Kirby Eades Gale Baker
LandOfFree
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