C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/547 (2006.01) A61K 31/33 (2006.01) A61K 31/66 (2006.01) C07D 311/24 (2006.01) C07D 405/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 493/04 (2006.01) C07F 9/655 (2006.01) C07F 9/6558 (2006.01) C07F 9/6571 (2006.01)
Patent
CA 2123768
Abstract of the Disclosure This invention relates to a compound represented by the formula: Image wherein B represents a hydrogen atom or a lower alkyl group; ring A represents a benzene ring which may have one or more substituents; Image represents a single or double bond; Q1 represents the group represented by the formula, Image , or a hydrocarbon residue substituted with the group represented by the formula, Image wherein X represents a bond or a spacer having a chain length of 1 to 4 atoms as the linear moiety which may have one or more side chains; R1 and R2, whether identical or not, independently represent a hydrogen atom or a lower alkyl, or may bind together to form a ring; Q2 represents a hydrogen atom, a hydrocarbon residue which may be substituted or a heterocyclic ring residue which may be substituted; or a salt thereof.
Oda Tsuneo
Sohda Takashi
Taketomi Shigehisa
Fetherstonhaugh & Co.
Takada Chemical Industries Ltd.
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