C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/04 (2006.01) A61K 31/44 (2006.01) A61K 31/495 (2006.01) C07D 311/22 (2006.01) C07D 311/58 (2006.01) C07D 311/96 (2006.01) C07D 493/04 (2006.01)
Patent
CA 2053962
Abstract The invention relates to novel substituted benzopyran derivatives of the general formula I, Image (I) in which R1 and R2, which can be identical or different, denote hydrogen, C1-6-alkyl, C3-7-branched alkyl, C3-7-cycloalkyl or together with the carbon atom enclosed by them denote C3-7-spiroalkyl, R3 denotes hydroxyl, C1-6-alkoxy, formyloxy, C1-8-alkyl- carbonyloxy, C6-10-arylcarbonyloxy, C1-8-alkoxycarbonyloxy, C1-6-monoalkylaminocarbonyloxy, C1-5-alkyleneamino- carbonyloxy substituted by C6-10-aryl or C1-8-dialkylamino- carbonyloxy,where the C1-8-alkyl or alkoxy groups can be either linear or branched, and R4 stands for hydrogen or R3 and R4 together form a bond, R5 denotes a 1H-2-pyridon-1-yl, 1H-6-pyridazinon-1-yl, 1H-2-pyrimidinon-1-yl, 1H-6-pyrimidinon-1-yl, 1H-2- pyrazinon-1-yl or 1H-2-thiopyridon-1-yl radical which is unsubstituted or monosubstituted or disubstituted by identical or different C1-6-alkyl, C3-7-branched alkyl, C3,cycloalkyl, fluorine, chlorine, bromine, iodine, C1-5- alkoxy, C3-7-branched alkoxy, C37-cycloalkoxy, hydroxyl, C1-6-alkoxycarbonyl, C1-6-alkylcarbonyloxy, C6-10-aryl- carbonyloxy, nitro, amino, amino mono- or disubstituted by C1-6-alkyl, C1-8-alkylcarbonylamino, C6-10-arylcarbonyl amino, cyano or carboxyl substituents, where these radicals can also be partially hydrogenated, R6 denotes difluoromethoxy, trifluoromethoxy, trifluoro- ethoxy, tetrafluoroethoxy, difluoromethylthio, difluoro- methylsulphinyl, difluoromethylsulphonyl, trifluoro- methylthio, trifluoromethylsulphinyl, trifluoromethyl- sulphonyl, trifluoroethylthio, trifluoroethylsulphinyl or trifluoroethylsulphonyl, where the heterocycle R5 is in the trans position to the radical R3, if R3 and R4 do not together form a bond but R4 stands for hydrogen, and their salts and acid addition salts, tautomers and optical isomers. The compounds are therapeutic active compounds.
Armah Ben
Muster Dieter
Ruhter Gerd
Schotten Theo
Stenzel Wolfgang
Armah Ben
Beiersdorf Gesellschaft Mit Beschrankter Haftung
Beiersdorf Aktiengesellschaft
Beiersdorf-Lilly Gmbh
Gowling Lafleur Henderson Llp
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