C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/180, 260/235
C07D 498/18 (2006.01) A61K 31/535 (2006.01) C07D 519/00 (2006.01)
Patent
CA 1256430
Abstract of the Disclosure A novel rifamycin derivative having the general formula (I): Image (I) or salts thereof, a process for preparing the same and antibacterial agents containing the same as an effective component. The rifamycin derivative of the present invention having the general formula (I) shows a strong antibacterial activity against the Gram-positive bacteria and the acid-fast bacteria.
500970
Hashizume Takuji
Watanabe Kiyoshi
Yamane Takehiko
Yamashita Katsuji
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
Osler Hoskin & Harcourt Llp
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