C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/309, 260/311
C07D 263/58 (2006.01) C07D 265/36 (2006.01) C07D 277/68 (2006.01) C07D 413/12 (2006.01)
Patent
CA 1182821
ABSTRACT OF THE DISCLOSURE Anti-allergic compounds of the formula: Image wherein, X is S or O R1 and R2 are each H, R3, OR4, halogen, cyano, COOR4, methanesulfonyl, nitro, trifluoromethyl or taken together, methylenedioxy, wherein R3 is lower alkyl or cycloalkyl of 3 to 7 carbon atoms and R4 is hydrogen or lower alkyl; and R is -Z-O-R3; -Z-N(R5R6); Z1-O-Z2-N(R5R6); -Z- heterocycle; -Z1-O-Z2-heterocycle; or -Z-O-C6H4R1 wherein each of R5 and R6 are hydrogen or lower alkyl, or when taken together with the nitrogen to which they are attached R5 and R6 form a nitrogen-hterocyclic ring, R1 and R3 have the meaning as above defined, and Z, Z1 and Z2 are each branched or unbranched alkylene chain containing from 2 to about 6 carbon atoms in the principal chain and a total of up to about 12 carbon atoms; Z1 and Z2 when taken together with a hetero atom form a saturated heterocyclic ring; and heterocycle represents a heterocyclic ring containing one or more of the hetero atoms, oxygen, nitrogen and sulfur and acid addition and amino acid and glucuronic acid conjugate salts thereof.
377169
Brown Richard E.
Loev Bernard
St. Georgiev Vassil
Mcfadden Fincham
Usv Pharmaceutical Corporation
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