C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/265.1, 260/2
C07D 295/18 (2006.01) C07D 209/48 (2006.01) C07D 215/48 (2006.01) C07D 215/50 (2006.01) C07D 215/54 (2006.01) C07D 217/26 (2006.01) C07D 237/28 (2006.01) C07D 241/44 (2006.01) C07D 261/18 (2006.01) C07D 295/192 (2006.01) C07D 307/79 (2006.01) C07D 307/84 (2006.01) C07D 307/86 (2006.01) C07D 311/12 (2006.01) C07D 311/58 (2006.01) C07D 311/84 (2006.01) C07D 317/68 (2006.01) C07D 319/18 (2006.01) C07D 333/54 (2006.01) C07D 333/60 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01)
Patent
CA 1210005
ABSTRACT OF THE DISCLOSURE A benzoylpiperazine ester of the following formula: Image wherein A represents a single bond or an alkylene group, vinylene group, -O-alkylene group or methine group, R1 represents a bicyclic carbon ring residue which may be substituted with a lower alkyl group, lower alkoxy group, oxo group or nitro group or a halogen atom, or may be partially saturated; a fluorene residue which may contain an oxo group; a fluorenylidene group; an anthracene residue; a phenanthrene residue which may be substituted with a lower alkyl group, or may be partially saturated; a benzofuran residue or thianaphthene residue which may be substituted with a lower alkyl group or lower alkoxy group; a benzopyran residue or benzoazine residue which may be substituted with an oxo group or phenyl group and partially saturated; a phthalimide residue; a benzodiazine residue; an isooxazole residue which may be substituted with a lower alkyl group or phenyl group; or an alkylene dioxybenzene residue or xanthene residue; and R2 represents an alkyl group, cycloalkyl group, cycloalkylalkyl group or aralkyl group, excepting the case where A is a single bond, R1 is Image , and R2 is a methyl group, exhibits excellent chymotrypsin inhibitive activity.
431034
Fujii Setsuro
Hattori Eizuo
Hirata Mitsuteru
Nagakura Masahiko
Onogi Kazuhiro
Gowling Lafleur Henderson Llp
Kowa Co. Ltd.
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