C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 295/096 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) C07D 211/22 (2006.01) C07D 295/112 (2006.01) C07D 401/00 (2006.01) C07D 403/00 (2006.01) C07D 405/00 (2006.01) C07D 409/00 (2006.01)
Patent
CA 2098140
ABSTRACT OF THE DISCLOSURE Compounds of the general formula I: Image I are disclosed as potent antipsychotic agents. Novel methods of use and intermediates used to make the compounds of formula I are also disclosed.
Baxter Ellen W.
Reitz Allen B.
Mcneilab Inc.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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