C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/435 (2006.01) A61K 31/55 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2097112
Abstract: Disclosed are a .beta.-carboline derivative represented by the formula: Image wherein R1 represents hydrogen atom, a lower alkyl group, a lower alkoxy group or hydroxy group; R5 rep- resents hydrogen atom, or R1 and R5 are bonded to rep- resent a lower alkylenedioxy group; R2 represents hydrogen atom, a halogen atom, a lower alkoxy group or hydroxy group; R3 represents hydrogen atom, a car- bamoyl lower alkyl group, a lower alkyl group, a car- boxy lower alkyl group or a lower alkoxycarbonyl lower alkyl group; R4 represents hydrogen atom, a lower alkyl group, a carboxy lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a lower alkanoyl group, an arylcarbonyl group, a lower alkanesulfonyl group, a lower alkoxycarbonyl group, an aralkyl group, formyl group or a di(lower alkyl)sulfamoyl group; n represents 0, 1 or 2; and the symbol * represents an asymmetric carbon atom, or a pharmaceutically acceptable salt thereof, and a process for preparing the same.
Hikota Masataka
Nagasaki Masaaki
Shikano Toshiro
Yamada Koichiro
Yura Takeshi
Marks & Clerk
Tanabe Seiyaku Co. Ltd.
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