C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1, 260/1
C07D 499/70 (2006.01) C07D 209/08 (2006.01) C07D 209/88 (2006.01) C07D 215/06 (2006.01) C07D 215/18 (2006.01) C07D 215/20 (2006.01) C07D 215/22 (2006.01) C07D 215/227 (2006.01) C07D 455/04 (2006.01) C07D 471/06 (2006.01) C07D 499/00 (2006.01) C07D 501/36 (2006.01)
Patent
CA 1133469
Abstract of the Disclosure A .beta.-lactam series compound represented by the formula [I] Image [I] wherein R1 represents a hydrogen atom or a lower alkyl group; R2 represents a hydrogen atom; R3 represents a halogen atom, a nitro group, an amino group, a hydroxy group, a lower alkyl group, a lower alkoxy group, a lower alkanoylamino group, a lower alkanesulfonyloxy group or a group represented by the formula Image where R5 represents a hydrogen atom, a lower alkanoyl group, or a lower alkanesulfonyl group, R4 represents a hydrogen atom or a hydroxy group, n is 0 or l; ? is 0, 1 or 2; and A represents -C(CH3)2-CH(COOH)- or -CH2C(CH2R6)=C(COOH)- where R6 represents a lower alkanoyloxy group, a group represented by the formula Image or Image where R7 and R8 each represents a lower alkyl group, and when n is 0, R1 and R2 can combine to form a cyclohexane ring together with the carbon atoms to which they arc attached and pharmaceuti- cally acceptable salts thereof as well as a method for preparing same are disclosed. These compounds have antimicrobial activity.
325375
Ishikawa Hiroshi
Nakagawa Kazuyuki
Tabusa Fujio
George H. Riches And Associates
Otsuka Pharmaceutical Co. Ltd.
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