C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 215/22 (2006.01) A61K 31/198 (2006.01) A61K 31/33 (2006.01) C07C 311/29 (2006.01) C07C 311/46 (2006.01) C07D 213/30 (2006.01) C07D 213/64 (2006.01) C07D 215/14 (2006.01) C07D 295/08 (2006.01) C07D 295/18 (2006.01) C07D 319/18 (2006.01)
Patent
CA 2548513
The present invention relates to biaryl sulfonamides of the formula 1: wherein: R1 is H or Cl-.C6 a]kyl; R2 is H, C I -C6 alkyl, (CH2)nR2' , phenyl, or benzyl; n is 0-6; R2'is aryl, heteroaryl, cycloalkyl, or heterocycloalkyl; R 3 is, independently with respect to each occurrence, H, halogen, OC(halogen)3,C(halogen)3, alkoxy, or C I -C 6 alkyl; X is selected from CH20, OCH2, C (R3)=(R3)2-C(R3)2, CH2NHC(=O), O(C=O)NH, O, C(=O)CH2, SO2CH2C(=O)NH, SO2NH, OC(=O), CH2S(O), and CH2S(O)2; and Z is at least one aryl or heteroaryl moiety, and their use as for example metalloproteinase inhibitors.
L'invention concerne des sulfonamides de biaryle de formule 1. R?1¿ est H ou alkyle Cl-.C6; R?2¿ est H, alkyle CI -C6, (CH¿2?)¿n?R?2'¿, phényle, ou benzyle; n vaut de 0 à 6; R?2'¿est aryle, hétéroaryle, cycloalkyle, ou hétérocycloalkyle; R ?3¿ est, indépendamment de chaque occurrence, H, halogène, OC(halogène)¿3?,C(halogène)¿3?, alcoxy, ou alkyle CI -C6; X peut être CH¿2?0, OCH¿2?, C (R?3¿)=(R?3¿)¿2?-C(R?3¿)¿2?, CH¿2?NHC(=O), O(C=O)NH, O, C(=O)CH¿2?, SO¿2?CH¿2?C(=O)NH, SO¿2?NH, OC(=O), CH¿2?S(O), et CH¿2?S(O)¿2?; et Z est au moins une fraction aryle ou hétéroaryle. L'invention concerne également l'utilisation des ces produits comme inhibiteurs de métalloprotéinase, par exemple.
Georgiadis Katy Evangelia
Hopper Darrin William
How David Brian
Hu Yonghan
Morris Elisabeth Ann
Torys Llp
Wyeth
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