C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/435 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 487/04 (2006.01) C07D 498/04 (2006.01) C07D 513/04 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2112165
A compound represented by formula (I): Image wherein X1 and X2 each represent a halogen atom; R1 represents a hydrogen atom or a substituent; R2 represents a substituted or unsubstituted bicyclic heterocyclic substituent; A represents a nitrogen atom or a substituted carbon atom; and R represents a hydrogen atom or a substituent, or a salt thereof is disclosed. The compound exhibits potent antimicrobial activity and also high safety due to reduced lipophilicity.
Kimura Youichi
Matsuhashi Norikazu
Takemura Makoto
Daiichi Pharmaceutical Co. Ltd.
Riches Mckenzie & Herbert Llp
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