Bilayer photosensitive imaging article including...

Details Bilayer photosensitive imaging article including... Bilayer photosensitive imaging article including...

G - Physics

03

C

96/185

G03C 1/52 (2006.01) G03F 1/10 (2006.01) G03F 3/10 (2006.01)

Patent

CA 1180931

BILAYER PHOTOSENSITIVE IMAGING ARTICLE ABSTRACT Bilayer photosensitive imaging articles comprising a sub- strate coated with an image layer and a resist layer are disclosed. The substrate may be transparent, translucent or opaque to give imaging articles useful in different applica- tions. The image layer which should be from about 0.3-3.0 microns in thickness includes an organic film-forming vehicle from the group of copolymers of the formula: IMG> and, where P is styrene, ethylene or methyl vinyl ether; m is 1-3; n is 1,10; X is OH, OHN2, ONH4, OR, ONH3R, ONH2R2, ONHR3, ONH3RNH2, ONa, OK, OLi; R is an alkyl group in the range C1-C10 optionally including a functional group such as ketone, alcohol, esther, ether alcohol or aryl; m=1-3, n=l-10; and the molecular weight is between 1,000-150,000. The image layer may also include a coloring medium. The resist layer, which should be from about 0.5 to about 2.0 microns in thickness, comprises a material which, upon expo- sure to actinic radiation, changes solubility with respect to a developer in which the imager layer is also soluble. The resist layer may be negative-working or positive-working. In an important embodiment of the invention, the chemical composition and physical parameters of imaging articles particularly suited to the production of half-tone images capable of subsequent etching are disclosed. These imaging articles exhibit unexpectedly excellent exposure and devel- opment latitude accompanied by outstanding etchability.

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