C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/20 (2006.01) A61L 2/18 (2006.01) C11D 1/14 (2006.01) C11D 1/22 (2006.01) C11D 1/24 (2006.01) C11D 3/37 (2006.01) C11D 3/48 (2006.01)
Patent
CA 2410796
A method of substantially reducing biofilm-associated microorganisms on a surface and a composition designed to substantially reduce biofilm-associated microorganisms on surfaces are disclosed. In one embodiment, the composition is an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, and aryl sulfonates with alkyl or aryl substituents, an acid, and an alcohol solvent, wherein the pH of the composition is between pH 1 and pH 6.
Cette invention concerne un procédé et des compositions permettant de réduire fortement la présence, sur des surfaces, de micro-organismes associés à un mucilage. Selon un mode de réalisation, la composition selon l'invention est un tensioactif anionique pris dans le groupe composé de sulfates d'alkyle, de sulfonates d'alkyle et de suIfonates d'aryle avec substituants alkyle ou aryle, d'un acide et d'un solvant à base d'alcool. Le pH de cette composition se situe entre 1 et 6.
Charaf Ursula K.
Hilgers Debra S.
Rees Wayne M.
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
S.c. Johnson & Son Inc.
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