Bis-azidophthalic acid derivatives

Details Bis-azidophthalic acid derivatives Bis-azidophthalic acid derivatives

C - Chemistry, Metallurgy

07

D

260/306.1, 260/5

C07D 209/48 (2006.01) G03F 7/008 (2006.01)

Patent

CA 1112246

Abstract of the Disclosure The compounds according to the invention have the formula Ia or Ib (Ia) Image or Image (Ib) in which R is a divalent organic radical. The novel bis-azidophthalic acid derivatives are suitable for the pro- duction of photo-curable mixtures. The novel compounds, and their mixtures, have better heat stability and oxidation resistance than known systems, whilst retaining equally good photosensitivity. Two different methods of preparation of the com- pounds are described.

313230

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