C - Chemistry – Metallurgy – 09 – B
Patent
C - Chemistry, Metallurgy
09
B
C09B 31/072 (2006.01) C09B 35/029 (2006.01) C09B 35/04 (2006.01) C09B 69/04 (2006.01)
Patent
CA 2183636
A bis-azo compound represented by the following general formula (1), a tautomer thereof or a salt thereof: Image wherein R represents a substituted or unsubstituted phenyl group or a substituted or unsubstituted heteroaryl group and X represents a substituted or unsubstituted phenylene group. These compounds exhibit low toxicity and do not have any undesirable effect such as mutagenecity.
La présente invention concerne un composé bisazo représenté par la formule générale (1), certains de ses tautomères ou certains de ses sels. Dans cette formule, R représente un phényle substitué ou non substitué ou un hétéroaryle substitué ou non substitué et X représente un phénylène substitué ou non substitué. Ces composés sont faiblement toxiques et exempts d'effets secondaires et notamment d'effets mutagènes.
Izushi Tadahiko
Kitaguchi Hiroshi
Mori Hideto
Nishikawa Naoyuki
Ogawa Tomohiro
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Fuji Photo Film Co. Ltd.
Merck Patent Gmbh
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