C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/3001, 400/70
C07D 249/20 (2006.01) C08K 5/3417 (2006.01) C08K 5/3475 (2006.01) C08K 5/42 (2006.01) C08L 23/00 (2006.01) C08L 101/00 (2006.01)
Patent
CA 2000934
Disclosed are bis-benzotriazolylphenol compounds having the formula (see fig. I) wherein R1 and R2 each is a 2-benzotriazolyl radical; R3 and R4 each is hydrogen, alkyl, aralkyl, alkoxy, aryl, carboxy, alkoxycarbonyl or halogen; and A is 1,3- or 1,4-phenylene. Also disclosed are synthetic polymeric materials stabilized with one of the above compounds.
Myers Garry Lynn
Wang Richard Hsu-Shien
Eastman Chemical Company
Gowling Lafleur Henderson Llp
Myers Garry Lynn
Wang Richard Hsu-Shien
LandOfFree
Bis-benzotriazolyl compounds and polymeric materials... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Bis-benzotriazolyl compounds and polymeric materials..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bis-benzotriazolyl compounds and polymeric materials... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1964576