C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
154/108, 400/201
C08G 81/00 (2006.01) B32B 27/06 (2006.01) C08G 65/00 (2006.01) C08G 69/00 (2006.01) C08G 69/40 (2006.01)
Patent
CA 1039886
BLOCK COPOLYMER OF POLYAMIDE AND POLYETHER, AND ITS PREPARATION AND USE ABSTRACT OF THE DISCLOSURE: A block copolymer of at least one polyamide and at least one polyether, the content of the polyether being about 0.2 to 10% by weight based on the block copolymer, having a scattering index of not less than about 1 wherein the particles of the polyether are agglomerated in a maximum size of not more than about 10 µ and dispersed in the block copolymer, the polyamide consisting of a diamine constituent containing 100 to 50 mol % of m-xylylenediamine or its mixture with p-xylylenediamine and the dicarboxylic acid constituent containing 100 to 50 mol % of at least one aliphatic dicarboxylic acid having 6 to 12 carbon atoms and the polyether having an amino group or a carboxyl group at least one terminal position and a molecular weight of about 2,000 to 20,000. The new polymer is useful for making shaped products such as films, having improved bonding strength, puncture resistance and low temperature impact resistance.
191942
Furukawa Kaoru
Matsunami Koichi
Nagai Hiroshi
Nagano Hikoichi
Tsukamoto Chiaki
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