C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
400/2019
C08G 2/38 (2006.01) C08G 63/08 (2006.01) C08G 63/664 (2006.01)
Patent
CA 1054741
ABSTRACT OF THE DISCLOSURE Block copolymer of the structure A-B wherein: - A is a polylactone block of recurring units: Image wherein PM is a linear polymethylene chain having from 2 to 13 carbon atoms, - B is a polyoxymethylene block of recurring units Image . The block copolymer contains at least 2 wt.% of block B and at least 0.1 wt.% of block A. The block copolymer can be used as modified polyacetal when rich in block B, or as special additive for plastics materials when rich in block A.
263660
Bianchi Gaudenzio
Colombo Paolo
Radici Pierino
Na
Societa' Italiana Resine S.i.r. S.p.a.
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