C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
400/2010, 400/20
C08F 293/00 (2006.01) C08F 297/02 (2006.01)
Patent
CA 2040457
BLOCK COPOLYMERS CONTAINING POLY(1,3-CONJUGATED DIENES) AND POLY(VINYLPHENOLS), SILYL PROTECTED POLY(VINYLPHENOLS) OR POLY(METAL PHENOLATES) Abstract of the Disclosure Diblock and triblock copolymers are disclosed consisting of a poly(l,3-conjugated diene) block and a block of a poly(vinylphenol), a silyl protected poly(vinylphenol), or a poly(metal phenolate).
Long Timothy E.
Teegarden David M.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
Long Timothy E.
Teegarden David M.
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