C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 283/00 (2006.01) C08F 293/00 (2006.01) C08G 75/02 (2006.01)
Patent
CA 2047756
-20- BLOCK COPOLYMERS CONTAINING VINYL AND ARYLENE SULFIDE SEGMENTS VIA CHAIN TRANSFER Abstract Block copolymers of vinyl monomers and thioarylene segments are prepared from copoly(arylene sulfide-disulfides), i.e., copoly(arylene sulfides) having an appreciable guantity of disulfide linkages in the polymer chains. Such copoly(arylene sulfides) correspond to the structure [(-A-S-)1-x (A-S-S-)x]n, wherein x is in the range of 0.5 to 0.001 based on the combined number of (-A-S-) and (A-S-S-) units. In a preferred embodiment n is at least 200; however, polymers and prepolymers having a much lower degree of polymerization can be used, e.g., materials where n is about 25 or higher. To prepare the block copolymers, an unsaturated monomer capable of undergoing free radical addition polymerization under the reaction conditions employed is subjected to such polymerization in the presence of the copoly(arylene sulfide-disulfide) having the above formula. During the course of the polymerization, chain transfer occurs resulting in formation of the block copolymers.
Eastman Chemical Company
Gowling Lafleur Henderson Llp
LandOfFree
Block copolymers containing vinyl and arylene sulfide... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Block copolymers containing vinyl and arylene sulfide..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Block copolymers containing vinyl and arylene sulfide... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1865218