C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 73/00 (2006.01) C08G 2/18 (2006.01) C08G 65/333 (2006.01) C08G 73/02 (2006.01) C08L 71/02 (2006.01) A61K 9/107 (2006.01) A61K 9/51 (2006.01)
Patent
CA 2381042
Disclosed are block copolymers represented by the following general formula (I) (see Formula I) wherein AI represents a hydroxyl group or an organic residue derived from an anionic polymerization initiator, R represents a hydrogen atom or an acyl group, NP represents a residue derived from a nucleophilic reagent, m is an integer of 2 to 20,000, and n is an integer of 1 to 20,000.
La présente invention concerne un copolymère séquencé représenté par la formule générale (I). Dans cette formule AI représente un groupe hydroxy ou un résidu organique dérivé d'un initiateur de polymérisation anionique, R représente un atome d'hydrogène ou un groupe acyle, NP représente un résidu dérivé d'un agent nucléophile, m est un entier compris entre 2 et 20000, et n est un entier compris entre 1 et 20000.
Akiyama Yoshitsugu
Kataoka Kazunori
Nagasaki Yukio
Nanocarrier Co. Ltd.
Smart & Biggar
LandOfFree
Block copolymers having a polymer segment derived from... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Block copolymers having a polymer segment derived from..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Block copolymers having a polymer segment derived from... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1630967