C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/114, 96/32, 2
C07D 403/12 (2006.01) C07D 275/06 (2006.01) C07D 417/12 (2006.01) C07D 421/12 (2006.01) G03C 1/42 (2006.01) G03C 7/305 (2006.01) G03C 8/10 (2006.01)
Patent
CA 1193268
Abstract of the Disclosure: .alpha.-Ketoimidomethyl blocked photographic reagents are useful in photographic elements, film units and processes. The blocked photographic reagents have the structure: Image wherein: Image X represents the atoms to complete a 5- or 6-mem- bered ring or ring system; R represents alkyl of 1 to 30 carbon atoms or aryl of 6 to 30 carbon atoms; and PR represents the residue of an organic photo- graphic reagent containing a heteroatom through which it is joined to the blocking group.
424099
Chen Chin H.
Vanmeter James P.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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