C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/327.4
C07F 5/02 (2006.01)
Patent
CA 1190936
A B S T R A C T This invention relates to new chiral organo- boranes of the general formula: Image in which X represents a methylene group or a sulphur atom, n and p are 0 or 1, and to a preparation process of these compounds, consisting in reacting a bicyclic substituted di- or tri-thiane with a borane such as B2H6 or BH3 : Lewis base. These novel borane complexes are useful in asymmetric hydroboration and reduction reactions.
399275
Aspisi Christian
Bonato Marc
Jacquier Robert
Goudreau Gage Dubuc
Societe D'expension Scientifique "expansia"
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