Boron doped semiconductor materials and method for producing...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/182, 345/23,

H01L 21/205 (2006.01) G03G 5/04 (2006.01) G03G 5/082 (2006.01) H01L 31/02 (2006.01) H01L 31/20 (2006.01)

Patent

CA 1263731

ABSTRACT An improved p-type semiconductor alloy film, improved photovoltaic and photoresponsive devices incorporating such films and radio frequency and microwave glow discharge methods for fabricating same. The improved semiconductor alloy films preferably include at least silicon deposited by the glow discharge of a compound containing at least silicon and a boron species that remains substantially mono-atomic as it is incorporated into the silicon matrix. The p-type film is particularly stable, is characterized by a non-narrowed band gap, reduced bulk stress, improved morphology, growth and adhesion and reduced peeling and cracking. The substantially intrinsic film is characterized by substantially reduced Staebler-Wronski degradation. The method includes the novel step of introducing a boron species that does not form higher order boron hydrides or other boron polymers or oligomers in a glow discharge plasma.

493979

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Boron doped semiconductor materials and method for producing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Boron doped semiconductor materials and method for producing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Boron doped semiconductor materials and method for producing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1233660

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.