C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
31/13
C09K 8/72 (2006.01)
Patent
CA 1062449
A B S T R A C T In reacting a siliceous material with an acidic solution containing hydrogen fluoride, the reaction rate is kept relatively low by contacting the material with an aqueous solution of a fluoride salt, a weak acid and a weak acid salt in proportions that maintain a significant but low concentration of hydrogen fluoride in the solution.
218986
Na
Shell Canada Limited
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