C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/242
C07D 519/00 (2006.01) A61K 31/33 (2006.01) A61K 31/695 (2006.01) C07D 477/20 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2028176
ABSTRACT Compounds of the formula: Image in which R1 is carboxy or protected carboxy, R2 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl, R3 is hydrogen or lower alkyl, R5 is unsaturated bicyclic heterocyclic group which may be substituted by suitable substituent(s), R5 is hydrogen or imino- protective group, and A is lower alkylene, or pharma- ceutically acceptablw salts thereof. These compounds exhibit high antimicrobial activity, and inhibit the growth of a wide variety of pathogenic microorganisms including Gram-positive and Gram-negative microorganisms and are useful as antimicrobial agents. The preparation of these compounds pharmaceutical compositions containing them, their use in the preparation of medicaments and the treatment of infectious diseases using them are also disclosed.
Matsuda Keiji
Murata Masayoshi
Tsutsumi Hideo
Fujisawa Pharmaceutical Co. Ltd.
Matsuda Keiji
Murata Masayoshi
Swabey Ogilvy Renault
Tsutsumi Hideo
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