C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/318, 260/304
C07D 209/82 (2006.01) A61K 31/405 (2006.01) C07D 209/88 (2006.01)
Patent
CA 1053682
ABSTRACT OF THE DISCLOSURE New carbazole derivatives of the formula Image (I) which are topical anti-inflammatory agents, are produced by dehydrogenating a tetrahydrocarbazole derivative of the formula Image (II) (III) in the above formulae, R1 represents a hydroxymethyl group; an alkanoyloxymethyl, tetrazolyl, cyano, oximinocarbonyl, amino- carbonyl or carboxyl groups R2 to R4 each represents a hydrogen atom, a halogen atom, a lower alkyl group, a trifluoromethyl group or a lower alkoxy group, R2 being in the 3-position or the 4-position; R5 and R6 have the same meanings as R2 to R4 or together represent the residue of a five- or six-membered isocyclic ring; and R7 represents a hydrocarbon residue con- taining 3 to 8 carbon atoms or, when at least one of the residues R2 to R6 is a substituent different from hydrogen, a hydrogen atom a methyl group or an ethyl group.
205063
Ahrens Hanns
Biere Helmut
Koch Henning
Rufer Clemens
Schroder Eberhard
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