Carbon-coated barrier films with increased concentration of...

Details Carbon-coated barrier films with increased concentration of... Carbon-coated barrier films with increased concentration of...

C - Chemistry, Metallurgy

08

J

C08J 7/06 (2006.01)

Patent

CA 2152308

Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp3 tetrahedrally-coordinated carbon. The seed material provides a template for the replication of sp3 tetrahedrally-coordinated carbon atoms in the deposited amorphous carbon coating.

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