C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/06 (2006.01) A61K 31/137 (2006.01) A61K 31/155 (2006.01) A61K 31/495 (2006.01) A61K 31/496 (2006.01) A61K 31/55 (2006.01) C07D 215/227 (2006.01) C07D 215/26 (2006.01) C07D 215/36 (2006.01) C07D 215/38 (2006.01)
Patent
CA 2067475
Disclosed are carbostyril derivatives of the general formula (see above formula) wherein R1a is a halogen or a lower alkoxy, lower alkyl, lower alkenyloxy, amino, lower alkanoylamino or lower alkylthio group; R2 is a phenyl group which optionally may have one or two substituents each independently selected from the group consisting of halogen, lower alkoxy, lower alkyl, nitro, amino, lower alkanoylamino, hydroxyl, cyano, phenyl-lower alkoxy and halo-lower alkyl; A is a lower alkylene group; and the carbon-carbon bond between the positions 3 and 4 of the carbostyril skeleton is a single bond or a double bond; and salts thereof, and pharmaceutical compositions containing the same, for use as a disturbance-of- consciousness improving agent, central nervous system stimulent or sigma receptor agonist.
Kikuchi Tetsuro
Oshiro Yasuo
Tanaka Tatsuyoshi
Tottori Katsura
Marks & Clerk
Otsuka Pharmaceutical Co. Ltd.
LandOfFree
Carbostyril derivatives and their use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Carbostyril derivatives and their use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Carbostyril derivatives and their use will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1839763