Carboxylic acid-containing polymer/resole resin stain-resists

Details Carboxylic acid-containing polymer/resole resin stain-resists Carboxylic acid-containing polymer/resole resin stain-resists

D - Textiles, Paper

06

M

D06M 15/41 (2006.01) D06M 15/227 (2006.01) D06M 15/233 (2006.01) D06M 15/263 (2006.01) D06M 15/347 (2006.01)

Patent

CA 2244855

A composition which provides polyamide substrates with resistance to staining by acid dyes comprising: (A) carboxylic acid-containing stain-resist polymers selected from: (i) methacrylic acid polymers, or (ii) hydrolyzed copolymers of malefic anhydride with ethylenically unsaturated aromatics, alpha-olefins, alkyl vinyl ethers or alkyl allyl ethers, or (iii) mixtures of (i) and (ii), and (B) resole condensates prepared by reacting bis(hydroxyphenyl)sulfone which contains no sulfonate or carboxylate groups with formaldehyde in the presence of an alkali metal hydroxide, at a bis(hydroxyphenyl)sulfone resole resin: carboxylic acid-containing stain-resist polymer weight ratio in the range between about 1:20 and 2.5:1.0 is disclosed.

Composition qui rend les substrats polyamides résistants aux taches avec des colorants acides comprend: (A) des polymères résistants aux taches et contenant de l'acide carboxylique, sélectionnés parmi: (i) les polymères de l'acide méthacrylique, ou (ii) les copolymères hydrolysés de l'anhydride maléique avec des aromatiques non saturés d'éthylène, des alpha-oléfines, des éthers vinyliques d'alcoyle ou des éthers d'allylique d'alcoyle, ou (iii) les mélanges de (i) et de (ii), et (B) des condensats de résol obtenus au moyen d'une réaction entre le bis(hydroxyphényl)sulfone, libre de groupes sulfonate ou carboxylate, et le formaldéhyde, en présence d'un hydroxyde métallique alcalin sur une résine de résol bis(hydroxyphényl)sulfone; on obtient ainsi un polymère contenant de l'acide carboxylique et résistant aux taches, avec un rapport pondéral d'environ 1:20 à 2,5:1,0.

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