C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
8/113, 134/3.1,
C07C 59/305 (2006.01) C11D 1/06 (2006.01) C11D 3/20 (2006.01) D06P 1/653 (2006.01)
Patent
CA 1130314
ABSTRACT OF THE DISCLOSURE Detergent compositions containing self-requestering surfactants the molecules of which contain both a hydrophilic structure and a lipophilic structure are disclosed. The com- positions comprise at least 5% by weight, of hydrosoluble salts having the formula Image in which R is alkyl, arylalkyl or alkylaryl of from 6 to 18 carbon atoms: at least one of the groups represented by Z is a -CH2-COO-Me+ carboxymethylene group in which Me+ represents an ion selected from sodium, potassium and ammonium ions and from quaternary onium cations, and combinations thereof, and the remaining Z groups, which may be the same or different, represent H or a carboxymethylene as defined above.
297825
Burzio Fulvio
Gafa Salvatore
Montedison S.p.a.
Robic Robic & Associes/associates
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