Cathode assembly with localized profiling capabilities

C - Chemistry – Metallurgy – 23 – C

Patent

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204/175, 356/187

C23C 16/50 (2006.01) C23C 16/04 (2006.01) C23C 16/54 (2006.01) H01J 37/32 (2006.01)

Patent

CA 1242992

ABSTRACT An improved glow discharge cathode assembly for depositing localized, preselected concentration profiles of dopant or other alterant elements into a depositing host matrix of a semiconductor alloy material that is continuously deposited onto a moving substrate.

491232

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