Cathode incorporating fixed or rotating target in...

Details Cathode incorporating fixed or rotating target in... Cathode incorporating fixed or rotating target in...

C - Chemistry, Metallurgy

23

C

C23C 14/00 (2006.01)

Patent

CA 2626915

A sputtering cathode apparatus having a hollow cylindrical sputter target that is fixed or rotatable about its central axis and an internal magnet assembly that is rotated axially within the sputter target.

La présente invention a trait à un appareil cathodique de pulvérisation comportant une cible de pulvérisation cylindrique creuse qui est fixée ou rotative autour de son axe central et un ensemble d'aimant interne qui est entraîné en rotation axial au sein de la cible de pulvérisation.

Affiliated with

Also associated with

Rating

Cathode incorporating fixed or rotating target in... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cathode incorporating fixed or rotating target in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathode incorporating fixed or rotating target in... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1472664