Cathodic sputtering apparatus

Details Cathodic sputtering apparatus Cathodic sputtering apparatus

C - Chemistry, Metallurgy

23

C

204/167, 204/167

C23C 14/34 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1230079

CATHODIC SPUTTERING APPARATUS ABSTRACT A rotatable magnetron cathode comprising an elongated cylindrical tubular member, magnetic means disposed in said tubular member, a plurality of individual target strips provided with the same or different coating materials to be sputtered removably secured to the tubular member, said target strips extending the axial direction of the tubular member and disposed in spaced parallel relation around the periphery thereof, and means for rotating or indexing the tubular member to bring selected target strips in position for sputtering opposite magnetic means.

459260

Affiliated with

Also associated with

Rating

Cathodic sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cathodic sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathodic sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1238579