C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/27
C11D 1/62 (2006.01) B01F 17/18 (2006.01)
Patent
CA 1299963
ABSTRACT OF THE DISCLOSURE The invention relates to new cationic surfactants based on quaternary ammonium compounds which are characterized by the general formula R1 - CHOH - CHR2 - ?R3R4R5 X- (I) wherein R1 may be a linear or branched alkyl residue having from 1 to 22 car- bon atoms; R2 may be hydrogen or a linear or branched alkyl residue having from 1 to 21 carbon atoms, the total number of carbon atoms of the substituents R1 and R2 being in the range of from 8 to 22; R3 and R4 represent methyl, ethyl, 2-hydroxyethyl or 2-hydroxypropyl; R5 represents an alkyl residue having from 4 to 6 carbon atoms or a phenalkyl residue having from 1 to 3 carbon atoms in the alkyl residue; and X- represents the anion of benzoic acid, of benzoic acid monosubstituted with CH3, NH3, NO2, COOH, OH or SO3H, of an aliphatic dicarboxylic acid having the general formula HOOC - (CH2)n -COOH wherein n is a number from 2 to 8, of fumaric acid, of maleic acid or of sulfosuccinic acid; and the use of such cationic surfactants in industrial cleaning agents.
539528
Geke Juergen
Rutzen Horst
Henkel Kommanditgesellschaft Auf Aktien
Swabey Ogilvy Renault
LandOfFree
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