Centrifugal flow distribution clarifier feedwell and method...

B - Operations – Transporting – 01 – D

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B01D 21/24 (2006.01) B01D 21/06 (2006.01)

Patent

CA 2630691

Apparatus and methods are provided for controlling influent feed to produce a substantially uniform flow to a clarifier tank (2) to thereby enhance the settling efficiency within the clarifier. The apparatus comprises a feedwell (24) having a roof (26) and continuous sidewall (28) that together define a feedwell main body enclosure. Influent is fed via a relatively inboard tangential feed mechanism (108) to the inside of the roof (26) from an entry point proximate the center of the roof (150). Influent energy is properly distributed via the action of centrifugal force to generate a uniform axial flow within the feedwell main body which, in turn, is fed into the clarifier tank. Optional baffle members (152, 158) may be provided in the housing to slow angular momentum of the influent which, due to its original feed location, would necessarily be at a relatively low level..

L~invention concerne un appareil et des procédés permettant de commander l~injection d~un influent pour obtenir un écoulement sensiblement uniforme vers un réservoir de décantation (2) pour ainsi améliorer l~efficacité de sédimentation dans le décanteur. L~appareil comprend un puits d~injection (24) ayant un toit (26) et une paroi latérale continue (28) qui définissent ensemble une enceinte de corps principal de puits d~injection. L~influent est injecté par le biais d~un mécanisme d~injection tangentiel (108) relativement en dedans vers l~intérieur du toit (26) depuis un point d~entrée près du centre du toit (150). L~énergie de l~influent est répartie correction par l~action d~une force centrifuge pour générer un écoulement axial uniforme dans le corps principal du puits d~injection qui, à son tour, est injecté dans le réservoir de décantation. Des éléments chicanes (152, 158) en option peuvent être montés dans le logement pour ralentir l~énergie cinétique angulaire de l~influent qui, compte tenu de son emplacement d~injection d~origine, se trouverait nécessairement à un niveau relativement bas.

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