C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/56 (2006.01) A61K 31/545 (2006.01) C07D 501/36 (2006.01) C07D 519/00 (2006.01)
Patent
CA 1288764
Abstract of the disclosure: Disclosed are a cephalosporin compound of the formula (I) Image wherein: R1 is an optionally protected amino group, R2 is a substituted or unsubstituted heterocyclic group having 1 to 3 hetero atoms selected from the group consisting of nitrogen and sulfur, and R3 is an optionally protected carboxyl group or a group -COO-, or a pharmaceutically acceptable salt thereof, processes for their preparation and the use thereof. The cephalosporin compound or a salt thereof is useful as an antimicrobial agent.
538516
Oine Toyonari
Wagatsuma Mitsuyoshi
Yamaguchi Totaro
Marks & Clerk
Oine Toyonari
Tanabe Seiyaku Co. Ltd.
Wagatsuma Mitsuyoshi
Yamaguchi Totaro
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