C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/302
C07D 417/12 (2006.01) A61K 31/545 (2006.01) C07D 501/24 (2006.01)
Patent
CA 2005787
- 90 - Abstract of the Disclosure Cephalosporin compounds of the formula: Image (I) wherein R1 is amino or protected amino; R2 is substituted or unsubstituted heterocyclic group having 1 - 3 hetero atoms selected from oxygen and sulphur; R3 is carboxyl or protected carboxyl; R4 is nucleophilic compound residue; R5 is carboxyl, protected carboxyl and -COO-, a pharmaceutically acceptable salt thereof and their synthetic intermediate of the formula: Image wherein R11 is amino or protected amino; R2 is substituted or unsubstituted heterocyclic group having 1 - 3 hetero atoms selected from oxygen and sulfur; R3 is carboxyl or protected carboxyl; -COOY is carboxyl or protected carboxyl. Said cephalosporin compound is useful as anti- bacterial agent.
Matsushita Tadahiro
Saito Kunio
Takamura Norio
Wada Masao
Yamaguchi Totaro
Kirby Eades Gale Baker
Matsushita Tadahiro
Saito Kunio
Takamura Norio
Tanabe Seiyaku Co. Ltd.
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