C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1
C07D 501/24 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1231940
-56- ABSTRACT A cephalosporin compound of the formula: Image (I) wherein R1 is hydrogen or lower alkyl; R2 is acetoxy or (1-methyl-1H-tetrazol-5-yl)thio, and R3 is carboxy; or R2 is a group of the formula: Image , R3 is -COO- and Y is hydroge, hydroxymethyl or carbamoyl; and n is an integer of 2 or 3, or a pharmaceutically acceptable salt thereof and processes for their preparation are disclosed. Said cephalosporin compound is useful as an antimicrobial agent.
433824
Ohshima Satoshi
Oine Toyonari
Sugano Hiroshi
Yamada Yoshihisa
Yamaguchi Totaro
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
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