C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/46 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 501/24 (2006.01) C07D 501/38 (2006.01) C07D 501/44 (2006.01) C07D 501/56 (2006.01)
Patent
CA 1284995
ABSTRACT OF THE DISCLOSURE A cephalosporin compound of the formula: (I) Image wherein R1 is a protected or unprotected amino group; either one of R2 and R3 is a lower alkylthio group, a hydroxy-lower alkylthio group, a formylamino-lower alkylthio group, a carboxy-lower alkylthio group, sulfamoyl group, a lower alkylsulfonyl group, sulfo group, amino group, formylamino group, carbamoylamino group, a lower alkanoylamino group, an N,N-di(lower alkyl)amino group, an N-formyl-N-lower alkylamino group, a lower alkylamino group, an N-(lower alkylsulfonyl)-amino group, a hydroxy-lower alkanoylamino group, a halogen atom, a lower alkoxy groups carboxy group, a formylamino-lower alkyl group, an amino-lower alkyl group, a lower alkylthio-lower alkyl group or a lower alkyl group; and the other one of R2 and R3 is hydrogen atom, carbamoyl group, amino group, formylamino group, a hydroxy-lower alkyl group or a lower alkyl group; or R2 and R3 are located at the 2- and 3-position of the pyridine ring and combined together to form an alkylene group of 3 or 4 carbon atoms; or a salt thereof and processes for preparing the same are disclosed. The cephalosporin compound (I) is useful as an antimicrobial agent.
538782
Oine Toyonari
Wagatsuma Mitsuyoshi
Yamaguchi Totaro
Gowling Lafleur Henderson Llp
Oine Toyonari
Tanabe Seiyaku Co. Ltd.
Wagatsuma Mitsuyoshi
Yamaguchi Totaro
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