C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/20 (2006.01) A61K 31/545 (2006.01) A61K 31/695 (2006.01) C07D 215/233 (2006.01) C07D 417/12 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2057129
- 88 - Abstract of the disclosure: Cephalosporin compounds of the formula [I]: Image [I] wherein R1 is amino or protected amino group, R2 is hydroxy, protected hydroxy group or lower alkoxy, R3 is carboxyl or protected carboxyl group, R4 is hydrogen, lower alkyl, lower alkenyl or a group of the formula: -CH2R41, R41 is nucleophilic residue, R5 is carboxyl, protected carboxyl group or a group of the formula: -COO , R6 is hydrogen or lower alkyl, and the dotted line means the presence or absence of double bond, or a pharmaceutically acceptable salt thereof, which have excellent antimicrobial activities and are useful as an antimicrobial drug.
Matsushita Tadahiro
Saito Kunio
Takamura Norio
Yamaguchi Toutaro
Kirby Eades Gale Baker
Matsushita Tadahiro
Saito Kunio
Takamura Norio
Tanabe Seiyaku Co. Ltd.
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