C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/106.1
C07D 501/24 (2006.01) C07D 277/34 (2006.01) C07D 277/36 (2006.01)
Patent
CA 1070294
CEPHALOSPORIN DERIVATIVES Abstract of the Disclosure A compound of the formula: Image wherein R1 represents hydrogen or an alkyl group, X represents oxygen or sulfur or a group of formula -NR2 (where R2 is hydrogen or an alkyl group and in the case of alkyl, it may form a ring joined with R1), and Y represents an acetoxy group or a group of formula -SR3 (where R3 is a 5 or 6 membered ring containing one to four nitrogens as hetero atoms which may be in the oxide form or, in addition to the nitrogen atom or atoms, one or more other hetero atoms selected from the group consisting of oxygen and sulfur, said ring being optionally substituted with one or more of a lower alkyl; a lower alkoxyl; amino; mercapto; hydroxyl; carboxyl; carbamoyl; substituted lower alkyl, mercapto, or amino group, or a halogen atom, or a pharmaceutically accept- able salt thereof, is found to have a broad antimicrobial spectrum and, in particular, effective against gram-negative bacteria including Escherichia coli, Klebsiella pneumoniae, Proteus vulgaris, Proteus morganii, as well as gram positive bacteria. Thus, these compounds may be used as antimicrobial agents for therapeutical purposes. -1-
216474
Minamida Isao
Miyawaki Toshio
Numata Mitsuo
Shiraishi Mitsuru
Yamaoka Masayoshi
LandOfFree
Cephalosporin derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cephalosporin derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cephalosporin derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-54509