C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/106
C07D 501/24 (2006.01)
Patent
CA 1099257
Abstract of the Disclosure A compound of the formula: Image wherein W represents a halogen and Y represents an acetoxy group or a group of formula -SR3 (where R3 is a nitrogen-containing heterocyclic group), or a salt thereof, is found to be a useful intermediate for the cephem compounds of the formula: Image which have a broad antimicrobial spectrum and, in particular, effective against gram-negative bacteria including Escherichia coli, Klebsiella pneumoniae, Proteus vulgaris, Proteus morganii, as well as gram positive ones, and thus may be used for anti- microbial agents in therapeutical purposes.
340052
Minamida Isao
Miyawaki Toshio
Numata Mitsuo
Shiraishi Mitsuru
Yamaoka Masayoshi
Gowling Lafleur Henderson Llp
Takeda Chemical Industries Ltd.
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